Best Photosensitive Resin Products,suppliers,manufacturers.

1,3,5-Triazine-2,4,6(1H,3H,5H)-trione, 1-(2-propenyl)-
1-(2-Propenyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione (monoallyl isocyanurate, MAIC), a mono-allylated isocyanurate crosslinker for high-performance resin systems.
- allyl isocyanurate
- crosslinker
- resin modifier
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Phenol, 4,4',4''-ethylidynetris[2,6-bis(methoxymethyl)-
4,4',4''-Ethylidynetris[2,6-bis(methoxymethyl)phenol] (HMOM-TPHAP), a highly substituted triphenol derivative for photoresist and photosensitive-resin applications.
- photoresist
- photosensitive resin
- resin precursor
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Phenol, 4,4',4''-ethylidynetris[2,6-bis(methoxymethyl)-
4,4',4''-Ethylidynetris[2,6-bis(methoxymethyl)phenol] (HMOM-TPHAP), a highly substituted triphenol derivative for photoresist and photosensitive-resin applications.
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5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol)
5,5'-Isopropylidenebis(m-xylene-2,α,α'-triol), a multifunctional phenolic alcohol used as a precursor for high-performance epoxy and thermoset resins.
- epoxy resin precursor
- thermoset
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photosensitive resin